science-softCon uv/vis spectra data base; www.uv-spectra.de, (C) science-softCon 2009 Substance: allyltrichlorosilane Other Names: silane, trichloro-2-propenyl- Formula: C3H5Cl3Si CAS-No.: 107-37-9 Study: absorption cross sections Authors: J.D. DeSain, L.E. Jusinski, C.A. Taatjes Title: Ultraviolet photochemistry of trichlorovinylsilane and allyltrichlorosilane: vinyl radical (HCCH2) and allyl radical (H2CCHCH2) production in 193 nm photolysis Journal/Source: Phys. Chem. Chem. Phys., 8, 2240-2248, (2006); DOI: 10.1039/b600755d Data: (diagram, table, disk): table, diagram Energy/Wavelength range: 190 - 213 nm Resolution: Temperature: 298 K Temperature dependence: Pressure/Concentration: Comments: The maximum absorption cross section in the region, at 191 nm, is sigma = (8.50 ± 0.06) × 10-18 cm2 for trichlorovinylsilane and sigma = (2.10 ± 0.02) × 10-17 cm2 for allyltrichlorosilane. By comparison of the transient visible absorption and the 1315 nm I atom absorption from 266 nm photolysis of vinyl iodide and allyl iodide, the absorption cross sections at 404 nm of vinyl radical ((2.9 ± 0.4) × 10-19 cm2) and allyl radical ((3.6 ± 0.8) × 10-19 cm2) were derived. The vinyl radical is formed promptly from the 193 nm photolysis of trichlorovinylsilane. The observed vinyl radical yield per 193 nm photon absorbed is 0.9 ± 0.2. The observed allyl radical yield per 193 nm photon absorbed is 0.7 ± 0.2. Author to whom correspondence should be addressed: (e-mail address):